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/Measurement Device, Lithography System And Exposure Apparatus, And Control Method, Overlay Measurement Method And Device Manufacturing Method
Abstract

A measurement device has: a slider which holds a substrate and is movable parallel to the XY plane; a drive system that drives the slider; a position measurement system which emits beams from a head section to a measurement surface in which grating section are provided on the slider, which receives respective return beams of the beams from the measurement surface, and which is capable of measuring position information in at least directions of three degrees of freedom including the absolute position coordinates of the slider; a mark detection system that detects a mark on the substrate; and a controller which detects the marks on the substrate using the mark detection system while controlling the drive of the slider, and which obtains the absolute position coordinates of each mark based on the detection result of each mark and measurement information by the position measurement system at the time of detection.

Full Text

What is claimed is:

A measurement device has: a slider which holds a substrate and is movable parallel to the XY plane; a drive system that drives the slider; a position measurement system which emits beams from a head section to a measurement surface in which grating section are provided on the slider, which receives respective return beams of the beams from the measurement surface, and which is capable of measuring position information in at least directions of three degrees of freedom including the absolute position coordinates of the slider; a mark detection system that detects a mark on the substrate; and a controller which detects the marks on the substrate using the mark detection system while controlling the drive of the slider, and which obtains the absolute position coordinates of each mark based on the detection result of each mark and measurement information by the position measurement system at the time of detection.
Timeline
Filed
02/19/2026
Published
06/25/2026
Granted
Not Available
IPC Codes(4)
G03F 9/00:Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (takes precedence G03F 7/22; preparation of photographic masks G03F 1/00; within photographic printing apparatus for making copies G03B 27/00)
G01B 11/00:Measuring arrangements characterised by the use of optical techniques
G01D 5/347:using displacement encoding scales