A cartridge may include a plurality of inspection chambers to provide a space in which a reaction solution is accommodated. The cartridge may also include a supply channel to provide a passage for the reaction solution supplied from an external source to flow to the plurality of inspection chambers. The cartridge may further include a plurality of resistance channels through which the reaction solution discharged from the plurality of inspection chambers flows. The plurality of resistance channels may be respectively connected to the plurality of inspection chambers to allow gas inside the inspection chambers to be discharged to the outside. A second resistance value which is the sum of the resistance values of the plurality of resistance channels may be greater than a first resistance value which is the sum of resistance values of the supply channel and the plurality of inspection chambers.