A method for reworking an optical element, in particular for microlithography, wherein the optical element has a first functional layer (203) which is optionally located on a figure individualised with figure processing for use in a first optical system or on an existing carrier layer (202). The method includes: over-coating the first functional layer (203) with an adjustment layer system (204), applying a carrier layer (205) onto the adjustment layer system (204), determining a setpoint wavefront effect for a new use of the optical element, carrying out a layer manipulation depending on the setpoint wavefront effect and applying a second functional layer (206) onto the carrier layer (205), wherein the optical element (200) is a lens or a wavefront correction element.