A plasma processing apparatus includes a controller including a storage and a processor. The storage stores a first rule including a first change rule and a second change rule. The processor includes a first recipe obtainer, a second recipe obtainer, a transition recipe generator, a first recipe changer, a second recipe changer, and a transition recipe changer. The first recipe obtainer obtains a first recipe. The second recipe obtainer obtains a second recipe. The transition recipe generator generates a transition recipe from the first recipe and the second recipe. The first recipe changer changes the first recipe over time based on an operation time of a radio-frequency power supply. The second recipe changer changes the second recipe over time based on an operation time of the radio-frequency power supply. The transition recipe changer changes the transition recipe.