Abstract
The present invention relates to a sputtering target consisting of an alloy consisting of Co, Zr, Ta and, optionally, one or more further element(s) X from the group of Mo, Pd, Ni, Ti, V, W, and B, characterized in that the target has a maximum magnetic permeability μmax of 60 or lower and/or characterized in that the target has a maximum pass through flux (PTF) variation (FMax−FMin)/FAverage of 0.2 or lower, preferably of 0.15 or lower, and most preferably of 0.10 or lower.
Full Text
What is claimed is:
The present invention relates to a sputtering target consisting of an alloy consisting of Co, Zr, Ta and, optionally, one or more further element(s) X from the group of Mo, Pd, Ni, Ti, V, W, and B, characterized in that the target has a maximum magnetic permeability μmax of 60 or lower and/or characterized in that the target has a maximum pass through flux (PTF) variation (FMax−FMin)/FAverage of 0.2 or lower, preferably of 0.15 or lower, and most preferably of 0.10 or lower.
Timeline
Filed
02/19/2026Published
06/25/2026Granted
Not AvailableIPC Codes(2)
C23C 14/34:Sputtering
C22C 19/07:based on cobalt