Abstract
A pellicle for a reflective photo mask includes a frame, a core layer having a front surface and a rear surface, and disposed over the frame, a first capping layer disposed on the front surface of the core layer, an anti-reflection layer disposed on the first capping layer, a barrier layer disposed on the anti-reflection layer, and a heat emissive layer disposed on the barrier layer.
Full Text
What is claimed is:
A pellicle for a reflective photo mask includes a frame, a core layer having a front surface and a rear surface, and disposed over the frame, a first capping layer disposed on the front surface of the core layer, an anti-reflection layer disposed on the first capping layer, a barrier layer disposed on the anti-reflection layer, and a heat emissive layer disposed on the barrier layer.
Timeline
Filed
02/20/2026Published
06/25/2026Granted
Not AvailableIPC Codes(3)
G03F 1/24:Reflection masks; Preparation thereof
G03F 1/64:characterised by the frames, e.g. structure or material thereof
H10P 76/40:of masks comprising inorganic materials