Abstract
A substrate handling chamber body is formed from a castable aluminum alloy including a manganese (Mn) constituent and an iron (Fe) constituent. The castable aluminum alloy has a manganese (Mn) constituent-to-iron (Fe) constituent ratio that between about 1.125 and about 1.525 to limit microporosity and shrinkage porosity within the castable aluminum alloy forming the substrate handling chamber body. Semiconductor processing systems and methods of making substrate handling chamber bodies for semiconductor processing systems are also described.
Full Text
What is claimed is:
A substrate handling chamber body is formed from a castable aluminum alloy including a manganese (Mn) constituent and an iron (Fe) constituent. The castable aluminum alloy has a manganese (Mn) constituent-to-iron (Fe) constituent ratio that between about 1.125 and about 1.525 to limit microporosity and shrinkage porosity within the castable aluminum alloy forming the substrate handling chamber body. Semiconductor processing systems and methods of making substrate handling chamber bodies for semiconductor processing systems are also described.
Timeline
Filed
02/25/2026Published
07/02/2026Granted
Not AvailableIPC Codes(5)
C22C 1/02:by melting
B22D 21/00:Casting non-ferrous metals or metallic compounds so far as their metallurgical properties are of importance for the casting procedure (apparatus for vacuum casting B22D 18/00); Selection of compositions therefor
C22C 21/08:with silicon