Abstract
[Problem] To provide a method for manufacturing a cured film having high film density, high film hardness and high etching resistance. [Means for Solution] A method for manufacturing a cured film comprising (1) applying a composition (i) above a substrate; (2) forming a hydrocarbon-containing film from the composition (i); and (3) irradiating the hydrocarbon-containing film with plasma, electron beam and/or ion to form a cured film. Use of the cured film.
Full Text
What is claimed is:
[Problem] To provide a method for manufacturing a cured film having high film density, high film hardness and high etching resistance.
[Means for Solution] A method for manufacturing a cured film comprising (1) applying a composition (i) above a substrate; (2) forming a hydrocarbon-containing film from the composition (i); and (3) irradiating the hydrocarbon-containing film with plasma, electron beam and/or ion to form a cured film. Use of the cured film.
Timeline
Filed
02/25/2026Published
07/02/2026Granted
Not AvailableIPC Codes(4)
G03F 7/11:having cover layers or intermediate layers, e.g. subbing layers
C08G 61/10:only aromatic carbon atoms, e.g. polyphenylenes
C09D 165/00:Coating compositions based on macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain (, take precedence C09D 107/00, C09D 161/00); Coating compositions based on derivatives of such polymers