Abstract
A support structure open on one side for an illumination optical unit of a microlithographic projection exposure apparatus has a frame extending in a longitudinal direction, with one or more mechanisms for increasing the stiffness of the frame, wherein ribs and/or planar stiffening elements serve as stiffening mechanisms.
Full Text
What is claimed is:
A support structure open on one side for an illumination optical unit of a microlithographic projection exposure apparatus has a frame extending in a longitudinal direction, with one or more mechanisms for increasing the stiffness of the frame, wherein ribs and/or planar stiffening elements serve as stiffening mechanisms.
Timeline
Filed
03/06/2026Published
07/09/2026Granted
Not AvailableIPC Codes(2)
G03F 7/00:Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P 76/00, H05K)
G02B 7/182:for mirrors