Provided are a novel alkoxyaminosilylamine compound, a method for preparing the same, a composition for depositing a silicon-containing thin film including the same, and a method for manufacturing a silicon-containing thin film using the same, and since the alkoxyaminosilylamine compound according to the present disclosure is thermally stable and highly volatile and reactive, it is very useful for stably manufacturing a silicon-containing thin film having excellent characteristics in a large temperature range.