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/Semiconductor Structure Having Deep Trench Capacitor And Method Of Manufacturing Thereof
Abstract

A semiconductor structure includes a substrate including a recess indented into the substrate, a capacitor structure at least partially disposed within the recess, and an interconnect structure disposed over and electrically connected to the capacitor structure. The capacitor structure includes a first electrode layer, a second electrode layer over the first electrode layer, and a first dielectric between the first electrode layer and the second electrode layer. The first electrode layer includes a first body portion disposed in and conformal to the recess and a first extending portion disposed on the substrate, and the second electrode layer covers the first dielectric, the first body portion and the first extending portion of the first electrode layer.

Full Text

What is claimed is:

A semiconductor structure includes a substrate including a recess indented into the substrate, a capacitor structure at least partially disposed within the recess, and an interconnect structure disposed over and electrically connected to the capacitor structure. The capacitor structure includes a first electrode layer, a second electrode layer over the first electrode layer, and a first dielectric between the first electrode layer and the second electrode layer. The first electrode layer includes a first body portion disposed in and conformal to the recess and a first extending portion disposed on the substrate, and the second electrode layer covers the first dielectric, the first body portion and the first extending portion of the first electrode layer.
Timeline
Filed
03/13/2026
Published
07/16/2026
Granted
Not Available
IPC Codes(6)
H10D 1/66:Conductor-insulator-semiconductor capacitors, e.g. MOS capacitors
H10D 1/00:Resistors, capacitors or inductors
H10D 62/10:Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies