/Conductive Member For Cleaning Focus Ring Of A Plasma Processing Apparatus
Abstract

A pedestal assembly is provided. The pedestal assembly includes an electrostatic chuck configured to support a workpiece. The pedestal assembly includes a focus ring have a top surface and a bottom surface. The focus ring can be configured to surround a periphery of the workpiece when the workpiece is positioned on the electrostatic chuck. The pedestal assembly includes a plurality of insulators. The pedestal assembly further includes a conductive member positioned between at least a portion of the bottom surface of the focus ring and at least a portion of one of the plurality of insulators.

Full Text

What is claimed is:

A pedestal assembly is provided. The pedestal assembly includes an electrostatic chuck configured to support a workpiece. The pedestal assembly includes a focus ring have a top surface and a bottom surface. The focus ring can be configured to surround a periphery of the workpiece when the workpiece is positioned on the electrostatic chuck. The pedestal assembly includes a plurality of insulators. The pedestal assembly further includes a conductive member positioned between at least a portion of the bottom surface of the focus ring and at least a portion of one of the plurality of insulators.
Timeline
Filed
03/26/2026
Published
07/30/2026
Granted
Not Available
IPC Codes(3)
H01J 37/32:Gas-filled discharge tubes (heating by discharge H05B)
H10P 72/72:using electrostatic chucks
H10P 72/76:using mechanical means, e.g. clamps or pinches