/Semiconductor Device
Abstract

A semiconductor device includes a chip having a principal surface, a semiconductor region of a first conductivity type formed in a surface layer portion of the principal surface, and a device structure having a source structure formed in the semiconductor region at an inner portion of the principal surface. A peripheral edge source electrode portion having a first outer edge is arranged on a peripheral edge portion of the principal surface and electrically connected to the source structure. A terminal region of a second conductivity type is formed in the semiconductor region at the peripheral edge portion and electrically connected to the peripheral edge source electrode portion. The terminal region includes a second outer edge positioned closer to a peripheral edge of the principal surface than the first outer edge, wherein a distance between the first and second outer edges is not less than 10 μm.

Full Text

What is claimed is:

A semiconductor device includes a chip having a principal surface, a semiconductor region of a first conductivity type formed in a surface layer portion of the principal surface, and a device structure having a source structure formed in the semiconductor region at an inner portion of the principal surface. A peripheral edge source electrode portion having a first outer edge is arranged on a peripheral edge portion of the principal surface and electrically connected to the source structure. A terminal region of a second conductivity type is formed in the semiconductor region at the peripheral edge portion and electrically connected to the peripheral edge source electrode portion. The terminal region includes a second outer edge positioned closer to a peripheral edge of the principal surface than the first outer edge, wherein a distance between the first and second outer edges is not less than 10 μm.
Timeline
Filed
03/27/2026
Published
07/30/2026
Granted
Not Available
IPC Codes(4)
H10D 30/66:Vertical DMOS [VDMOS] FETs
H10D 62/10:Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
H10D 62/832:being Group IV materials comprising two or more elements, e.g. SiGe