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/Facet Mirror For An Illumination Optical Unit For Projection Lithography Suitable For Use As First Facet Mirror
Abstract

A facet mirror for a projection lithography illumination optical unit is suitable for use as first facet mirror such that individual mirror groups of the facet mirror, as first facets, are imaged at least into partial fields of an object field of the illumination optical unit with the aid of a transfer optical unit. The facet mirror has an array arrangement of individual mirror units, with each individual mirror unit being a sub-array of individual mirrors. The facet mirror has at least two pre-tilt types of the individual mirror units. A first pre-tilt type has individual mirror units which, in a neutral position, have a first pre-tilt angle relative to a base tilt angle specified by a carrier geometry of the facet mirror. A second pre-tilt type has individual mirror units with a second pre-tilt angle different from the first pre-tilt angle.

Full Text

What is claimed is:

A facet mirror for a projection lithography illumination optical unit is suitable for use as first facet mirror such that individual mirror groups of the facet mirror, as first facets, are imaged at least into partial fields of an object field of the illumination optical unit with the aid of a transfer optical unit. The facet mirror has an array arrangement of individual mirror units, with each individual mirror unit being a sub-array of individual mirrors. The facet mirror has at least two pre-tilt types of the individual mirror units. A first pre-tilt type has individual mirror units which, in a neutral position, have a first pre-tilt angle relative to a base tilt angle specified by a carrier geometry of the facet mirror. A second pre-tilt type has individual mirror units with a second pre-tilt angle different from the first pre-tilt angle.
Timeline
Filed
03/26/2026
Published
07/30/2026
Granted
Not Available
IPC Codes(1)
G03F 7/00:Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P 76/00, H05K)