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/Illumination Optical Unit For Projection Lithography, And Method For Monitoring Such An Illumination Optical Unit
Abstract

An illumination optical unit for projection lithography has a transfer facet mirror, an illumination specification facet mirror and a monitoring device. The latter has at least one spatially resolving monitoring sensor and a satellite facet, which belongs to the transfer facet mirror and is assigned to in each case exactly one monitoring transfer facet. The satellite facet is oriented in such a way that monitoring light from a monitoring light source is guided via the satellite facet and an illumination specification facet to be monitored, which is assigned to the monitoring transfer facet via an illumination channel, along a monitoring light channel to the monitoring sensor. The result is an illumination optical unit in which a tilting of illumination specification facets of an illumination specification facet mirror can be effectively monitored.

Full Text

What is claimed is:

An illumination optical unit for projection lithography has a transfer facet mirror, an illumination specification facet mirror and a monitoring device. The latter has at least one spatially resolving monitoring sensor and a satellite facet, which belongs to the transfer facet mirror and is assigned to in each case exactly one monitoring transfer facet. The satellite facet is oriented in such a way that monitoring light from a monitoring light source is guided via the satellite facet and an illumination specification facet to be monitored, which is assigned to the monitoring transfer facet via an illumination channel, along a monitoring light channel to the monitoring sensor. The result is an illumination optical unit in which a tilting of illumination specification facets of an illumination specification facet mirror can be effectively monitored.
Timeline
Filed
03/26/2026
Published
07/30/2026
Granted
Not Available
IPC Codes(3)
G03F 7/00:Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H10P 76/00, H05K)
G02B 26/08:for controlling the direction of light (in light guides G02B 6/35)
H10P 76/00:Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography