A plasma processing system has a supply, a main body section, and controller circuitry. The supply supplying each of a plurality of heat media, the plurality of heat media having a different temperature. The main body section has, formed therein, a plurality of flow paths that respectively allow the plurality of heat media to separately flow therethrough, and is included in the plasma processing system. The controller circuitry performs control, when a first heat medium of the plurality of heat media is caused to flow through the plurality of flow paths from the supply, to cause a second heat medium of the plurality of heat media and other than the first heat medium to be discharged from the plurality of flow paths.