/Monoalkyl Tin Trialkoxides And/or Monoalkyl Tin Triamides With Low Metal Contamination And/or Particulate Contamination, And Corresponding Methods
Abstract
The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.
Full Text
What is claimed is:
The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.
Timeline
Filed
04/14/2026Published
08/20/2026Granted
Not AvailableIPC Codes(2)
G03F 7/004:Photosensitive materials (, take precedence G03F 7/12, G03F 7/14)
G03F 7/20:Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B 27/00)