/Semiconductor Device
Abstract

A semiconductor device includes a substrate; a first power supply line extending in a first direction in plan view on a first surface of the substrate; a first conductive wall and a second conductive wall formed in the substrate and extending in the first direction shifted from the first power supply line in a second direction different from the first direction in plan view; a first semiconductor layer and a second semiconductor layer provided on a second surface of the substrate on an opposite side of the first surface and overlapping with the first power supply line in plan view; a first through via formed in the substrate and connecting the first power supply line and the second semiconductor layer; a third semiconductor layer formed over the first semiconductor layer; and a fourth semiconductor layer formed over the second semiconductor layer.

Full Text

What is claimed is:

A semiconductor device includes a substrate; a first power supply line extending in a first direction in plan view on a first surface of the substrate; a first conductive wall and a second conductive wall formed in the substrate and extending in the first direction shifted from the first power supply line in a second direction different from the first direction in plan view; a first semiconductor layer and a second semiconductor layer provided on a second surface of the substrate on an opposite side of the first surface and overlapping with the first power supply line in plan view; a first through via formed in the substrate and connecting the first power supply line and the second semiconductor layer; a third semiconductor layer formed over the first semiconductor layer; and a fourth semiconductor layer formed over the second semiconductor layer.
Timeline
Filed
04/14/2026
Published
08/20/2026
Granted
Not Available
IPC Codes(4)
H10W 20/43:Layouts of interconnections
H10D 84/85:Complementary IGFETs, e.g. CMOS
H10W 20/20:Interconnections within wafers or substrates, e.g. through-silicon vias [TSV]