The present application discloses a mask pattern optimization method, an electronic device, and a program product. The method comprises determining a target optimization model from a plurality of optimization models based on an optimization accuracy requirement, the optimization models being obtained by training a design layout and a ridge point pattern with consistency; inputting a first design layout to the target optimization model to obtain a model prediction result; determining a ridge point pattern based on the model prediction result and the first design layout, the ridge point pattern comprising a plurality of ridge points containing direction information; and generating a first mask pattern based on the first design layout and the ridge points. In the present application, the mask patterns after ILT optimization have data consistency. An appropriate optimization model may be selected based on an optimization accuracy to ensure balance between calculation complexity and model accuracy.