/Spherical Aberration Adjustment Method For Objective Optical System, Objective Optical System And Laser Machining Device
Abstract
A spherical aberration adjustment method for an objective optical system having an objective lens, and a diopter adjusting optical system arranged on an opposite side of a medium with respect to the objective lens, including changing an emittance or convergence of a luminous flux of laser light by the diopter adjusting optical system, and changing a depth of a focal point inside the medium with a diffraction limit of the objective optical system kept.
Full Text
What is claimed is:
A spherical aberration adjustment method for an objective optical system having an objective lens, and a diopter adjusting optical system arranged on an opposite side of a medium with respect to the objective lens, including changing an emittance or convergence of a luminous flux of laser light by the diopter adjusting optical system, and changing a depth of a focal point inside the medium with a diffraction limit of the objective optical system kept.
Timeline
Filed
05/04/2026Published
09/10/2026Granted
Not AvailableIPC Codes(2)
G02B 27/00:Optical systems or apparatus not provided for by any of the groups
G02B 15/14:by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective