Erase operations can be performed selectively on one of erase blocks or a memory array coupled to the same string by creating a pseudo PN junction that is located adjacent to the selected erase block. The pseudo PN junction is created by including channel inversion at least on those portions of the string coupled to unselected erase blocks, which further creates a flow of electrons. As a result of the channel inversion (along with channel accumulation created adjacent to the channel inversion), the flow of gate induced drain leakage (GIDL) holes are further generated from the pseudo PN junction and GIDL holes are induced to tunnel into memory cells of the selected erase block.