/Multi-beam Charged Particle Microscope Design With Improved Detection System For Secondary Electron Imaging Over A Large Range Of Landing Energies Of Primary Electrons
Abstract
A multi-beam charged particle system comprises a secondary electron imaging system configured for a compensation of imaging or pupil aberrations over a large range of landing energies of primary charged particles. A method operates the multi-beam charged particle system. The disclosed system and methods can allow for a systematic approach to compensation of imaging or pupil aberrations of a secondary electron imaging system is enabled. The disclosure can be applied, for example, to wafer inspection with a multi-beam charged particle system.
Full Text
What is claimed is:
A multi-beam charged particle system comprises a secondary electron imaging system configured for a compensation of imaging or pupil aberrations over a large range of landing energies of primary charged particles. A method operates the multi-beam charged particle system. The disclosed system and methods can allow for a systematic approach to compensation of imaging or pupil aberrations of a secondary electron imaging system is enabled. The disclosure can be applied, for example, to wafer inspection with a multi-beam charged particle system.
Timeline
Filed
05/21/2026Published
09/17/2026Granted
Not AvailableIPC Codes(5)
H01J 37/28:with scanning beams
H01J 37/145:Combinations of electrostatic and magnetic lenses
H01J 37/147:Arrangements for directing or deflecting the discharge along a desired path (lenses H01J 37/10)