Embodiments described herein may be related to creating a low resistance electrical path within a transistor between a front side trench connector and back side contacts and/or metal layers of the transistor. The low resistance electrical path does not go through a fin of the transistor that includes epitaxial material, but rather may go through a conductive path that does not include an epitaxial material. Embodiments may be compatible with a self-aligned back side contact architecture, which does not rely on deep via patterning. Other embodiments may be described and/or shown.