Abstract
A pre-classification of potential mask defects on the basis of machine learning is provided during the inspection of a mask for EUV lithography.
Full Text
What is claimed is:
A pre-classification of potential mask defects on the basis of machine learning is provided during the inspection of a mask for EUV lithography.
Timeline
Filed
06/03/2026Published
09/24/2026Granted
Not AvailableIPC Codes(3)
G01N 21/956:Inspecting patterns on the surface of objects
G01N 21/88:Investigating the presence of flaws, defects or contamination
G03F 1/84:Inspecting