/Process And Apparatus To Remove Metal-containing Films From A Chamber
Abstract

Embodiments disclosed herein include methods for removing a metal containing layer from a chamber of a tool. In an embodiment, the method comprises generating a remote plasma in the tool. The method may continue with flowing reactive species from the remote plasma into the chamber, and flowing a hydrocarbon gas into the chamber. In an embodiment, the method may include reacting the reactive species with the hydrocarbon gas within the chamber. In an embodiment, the method may further comprise etching the metal-containing material in the chamber.

Full Text

What is claimed is:

Embodiments disclosed herein include methods for removing a metal containing layer from a chamber of a tool. In an embodiment, the method comprises generating a remote plasma in the tool. The method may continue with flowing reactive species from the remote plasma into the chamber, and flowing a hydrocarbon gas into the chamber. In an embodiment, the method may include reacting the reactive species with the hydrocarbon gas within the chamber. In an embodiment, the method may further comprise etching the metal-containing material in the chamber.
Timeline
Filed
06/12/2026
Published
10/01/2026
Granted
Not Available
IPC Codes(2)
C23F 1/44:Compositions for etching metallic material from a metallic material substrate of different composition
C23C 16/455:characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber