/Substrate Support And Substrate Processing Apparatus
Abstract

A structure efficiently provides bias power to an object placed on a substrate support. A substrate support includes a dielectric portion and at least one electrode. The at least one electrode is located in the dielectric portion to provide bias power to an object placed on the dielectric portion.

Full Text

What is claimed is:

A structure efficiently provides bias power to an object placed on a substrate support. A substrate support includes a dielectric portion and at least one electrode. The at least one electrode is located in the dielectric portion to provide bias power to an object placed on the dielectric portion.
Timeline
Filed
06/12/2026
Published
10/01/2026
Granted
Not Available
IPC Codes(2)
H01J 37/32:Gas-filled discharge tubes (heating by discharge H05B)
H10P 72/72:using electrostatic chucks