A dual-wipe system includes a first wipe having a first treatment composition and a second wipe having a second treatment composition different from the first treatment composition. The wipes are maintained separately before use in a multi-compartment dispenser, sachet, twin-pack pouch, dual-chamber package, or other separated package. The system supports sequential use in which the first wipe is applied to a target area to prepare, treat, loosen, lift, solubilize, condition, or otherwise modify material at the target area, and the second wipe is applied after the first wipe to remove, neutralize, dilute, complete, or otherwise modify at least a portion of the first treatment composition or the material affected by the first treatment composition. The system may reduce the need to carry separate formulation containers, rinse sources, or additional wipe packages.